Entegris Announces New Post-CMP Cleaning Solutions for Advanced Semiconductor Manufacturing
BILLERICA, Mass., 2016-01-26 16:39 CET (GLOBE NEWSWIRE) --
Entegris, Inc. (NASDAQ:ENTG), a leader in yield-enhancing materials and solutions for highly advanced manufacturing environments, today announced new post-chemical mechanical planarization (post-CMP) cleaning solutions for semiconductor manufacturing. The new PlanarClean®AG family of products were designed for use in 10 nm processes and below, and add to Entegris’ leading portfolio of post-CMP cleaning solutions.
“Entegris has been the industry leader in post-CMP cleaning for many years. Our PlanarClean family products have been widely used in wafer fabs around the world. To address greater complexity of wafer production at the leading-edge nodes due to the addition of many new materials, such as cobalt and tungsten, we carefully re-formulated our PlanarClean solution to provide superior cleaning without damaging advanced films or new materials,” said Cuong Tran, director of post-CMP cleans for Entegris. “PlanarClean AG meets the needs for advanced processes, while also conforming to new safety guidelines outlined by our customers.”
The CMP process in silicon wafer production consists of a mechanical polishing step which utilizes a chemical slurry formulation to remove unwanted conductive or dielectric materials from the surface of the integrated device, achieving a flat and smooth surface upon which additional layers of integrated circuitry are built. The post-CMP cleaning step removes nanoparticles to minimize potential wafer defects while maintaining the integrity of the layers of materials already in place.
Changes to the number and types of films and materials exposed during cleaning in advanced processes have highlighted a need for specifically formulated cleans. In addition, changes to the particles used in slurries have rendered many of the traditional post-CMP cleaners ineffective and inefficient for leading-edge technologies, specifically in Front-End-of-Line (FEOL) processes. These challenges are now pushing semiconductor manufacturers to consider formulated cleans over commodity cleans.
PlanarClean AG formulated solutions meet these needs by providing one-step, superior cleaning in advanced processes that include copper, cobalt and tungsten, while protecting the underlying thin films and materials. Its proprietary formulation offers increased performance through enhanced reliability and yield, low to zero corrosion and defects and increased queue time. In addition, PlanarClean AG provides a cost-of-ownership advantage by reducing the amount of chemistry required in the cleaning step, and meets the latest EHS safety requirements for fab chemistries. The products have been successfully evaluated in multiple leading-edge fabs and are currently available to all customers.
For more information, please visit the Entegris booth at SEMICON®Korea, Hall D, Booth #5612, through Friday, January, 29th, or contact your local Entegris representative or visit www.entegris.com.
Entegris is a leading provider of a wide range of products for purifying, protecting, and transporting critical materials used in processing and manufacturing in the semiconductor and other high-tech industries. Entegris is ISO-9001 certified and has manufacturing, customer service and/or research facilities in the United States, China, France, Germany, Israel, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information may be found atwww.entegris.com.
Entegris®, Entegris Rings Design®, Creating a Material Advantage®and PlanarClean®are all trademarks of Entegris, Inc. SEMICON®is a trademark of Semiconductor Equipment and Materials International Corporation.
Brand & Marcom Mgr.
T +1 480 290 8748
PlanarClean® AG Products Are Optimized for Copper and Tungsten Processes at 10 nm and Below
Information om Nasdaq OMX
Følg pressemeddelelser fra Nasdaq OMX
Skriv dig op her og modtag pressemeddelelser på mail. Indtast din mail, klik på abonner og følg instruktionerne i den udsendte mail.
Flere pressemeddelelser fra Nasdaq OMX
Elemica19.3.2018 13:11 | pressemeddelelse
New Elemica Trace Solution Delivers Shipment Risk Analysis for Digital Transformation
Abeona Therapeutics Inc16.3.2018 22:34 | pressemeddelelse
Abeona Therapeutics Reports Fourth Quarter 2017 Financial Results and Business Highlights
Bromium16.3.2018 13:03 | pressemeddelelse
Up to $200 Billion in Illegal Cybercrime Profits Is Laundered Each Year, Comprehensive Research Study Reveals
Z-Wave Alliance16.3.2018 11:01 | pressemeddelelse
Z-Wave Alliance Dominates Building Automation Space at Light + Building 2018
RFA15.3.2018 13:02 | pressemeddelelse
RFA Names Richard Muckle as Head of Client Development for its EMEA Headquarter
Mitratech15.3.2018 13:02 | pressemeddelelse
Mitratech Strengthens Position in African Market with Union Systems Partnership
I vores nyhedsrum kan du læse alle vores pressemeddelelser, tilgå materiale i form af billeder og dokumenter, og finde vores kontaktoplysninger.Besøg vores nyhedsrum